Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

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Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

PDF) Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

PDF] Diffusion of Water Molecules in Amorphous Silica

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

Classification of the Categories of Amorphous Hydrogenated Silicon Oxynitride Films Using Infrared Spectroscopy

Hydrogen content as a function of the refractive index for SiO x N y :H

PDF) Stability of SiNx Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature

PDF] Moisture Resistance of Insulating Films for Compound Semiconductor Devices

PDF) Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures